The Extreme Physics Pushing Moore’s Law to the Next Level

推荐理由

Seeker released a very insightful feature about the ASML Extreme UV / soft X-ray (13.5 nanometers) photolithography system

推荐car · 原文2019年11月

说明

这是2019年由Seeker发布的一部纪录片，主题归在Semiconductors & chip manufacturing。它讲的是euv lithography这一支里的具体问题，而不是把整个领域扫一遍。适合按兴趣直接看、不打算先补课的人。内容上可以概括成：Seeker's Focal Point short documentary on ASML's extreme ultraviolet lithography machines, which make the most advanced chips. It shows how plasma-generated 13.5 nm light is used to push Moore's Law forward.这些读者给出的理由，核心是：HN links it in semiconductor threads as an accessible overview of why EUV lithography is so hard.它贴着当时的技术，看的时候要记得那是那个年份的判断。从2019年到2023年，有5位不同的读者在4个不同月份把它推荐出来，其中明确叫别人去看的有1次。适合先建立人物和来龙去脉的人。看完要能说出这件事是怎么发生的。如果已经会了基本定义，就把注意力放在它怎么把euv lithography变成能跟着复述的例子。

视频信息

频道

Seeker

时长

11 分 52 秒

发布年份

2019

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