PickVidsUnveiling High NA EUV | ASML
推荐理由
I recommend highly to everyone who thinks a startup can challenge ASML this 1.38min video
强烈推荐ta12653421 · 原文
说明
这是2024年由ASML发布的一部演示，主题归在Semiconductors & chip manufacturing。它讲的是euv lithography这一支里的具体问题，而不是把整个领域扫一遍。适合按兴趣直接看、不打算先补课的人。内容上可以概括成：ASML's short promotional fly-through of its High NA EUV lithography platform, the TWINSCAN EXE, which supports 8-nanometer resolution. It shows the machine's internals including advanced anamorphic optics.这些读者给出的理由，核心是：HN links it to show the sheer complexity of EUV machines, especially when discussing whether competitors can challenge ASML.它贴着当时的技术，看的时候要记得那是那个年份的判断。从2024年到2025年，有1位不同的读者在1个不同月份把它推荐出来，其中明确叫别人去看的有1次。适合先看结果再决定要不要深挖的人。先看它做成了什么。如果已经会了基本定义，就把注意力放在它怎么把euv lithography变成能跟着复述的例子。
视频信息
- 频道
- ASML
- 时长
- 1 分 39 秒
- 发布年份
- 2024
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